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本文阐述了SIPOS膜的钝化机理,给出了采用LPCVD法生长SIPOS的方法,并对所生长的SIPOS进行了多项性能测试,最后给出了分别采用SIPOS、Si_3N_4双层钝化结构和SiO_2,Si_3N_4双层钝化结构钝化的晶体管多项对比实验,实验结果表明,SIPOS钝化膜具有优良的钝化性能和钝化效果。
In this paper, the passivation mechanism of SIPOS film is described, and the method of growing SIPOS by LPCVD is given. A number of performance tests on the grown SIPOS are carried out. Finally, the SIPOS, Si_3N_4 passivation structure and SiO_2 , Si_3N_4 double-pass passivated passivation structure of a number of transistor experiments, the experimental results show that, SIPOS passivation film has excellent passivation and passivation effect.