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利用声表面波(SAW)的频散特性来表征超大规模集成电路(ULSI)互连系统中低介电常数(k)薄膜的物性具有准确、快速、对材料无损伤等突出优点.研究了Si(100)衬底上淀积低k薄膜的分层结构中,SAW沿任意方向传播的色散关系.引入坐标变换后,单层薄膜特征矩阵从9阶降到6阶,双层薄膜特征矩阵从15阶降到10阶,大幅度提高了计算速度,有利于生产ULSI过程中的在线监测.
The dispersion characteristics of surface acoustic wave (SAW) are used to characterize the properties of low dielectric constant (k) films in ultra-large scale integrated circuit (ULSI) interconnection system with the advantages of accuracy, rapidness, (100), the dispersion relation of SAW along any direction propagates in the layered structure with low-k films deposited on the substrate. After the coordinate transformation is introduced, the single-layer film characteristic matrix is reduced from 9th order to 6th order, 15 orders down to 10 orders, a substantial increase in computational speed, conducive to the production of ULSI online monitoring process.