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将硼微晶玻璃源均匀扩散条件及浓度控制方法用于RCGTOp基区扩散,研制成功200A/1000VRCGTO。
The boron glass-ceramic source uniform diffusion conditions and concentration control method for RCGTOp base diffusion, the successful development of 200A / 1000VRCGTO.