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《真空物理与技术及其在电子器件中的应用》下册即将出版。由胡汉泉、王迁主编的《真空物理与技术及其在电子器件中的应用》分上、下两册。下册主要内容为表面分析、真空击穿、蒙特卡诺法的应用、真空中的气体来源与物质迁移、消气剂、电真空器件的排气,以及密封电真空器件内真空度测量等。本书既着重于阐明真空技术的物理基础,又充分反映了近二十年来国内外真空技术的新成果和发展动向。读者对象:从事真空技术的研究、生产、应用的广大科技工作者,包括大专院校有关专业的师生及研究生。上册已于1982年6月出版。下册将于1985年4月由国防工业出版社出版。下册的统一书号
“Vacuum Physics and Technology and its application in electronic devices,” the next volume is about to be published. By Hu Hanquan, edited by Wang Qian “vacuum physics and technology and its application in electronic devices” points up and down two volumes. The main contents of the second volume are surface analysis, vacuum breakdown, the application of Monte-Carlo method, the source of gas and material migration in vacuum, the getter, the exhaust of electric vacuum device, and the vacuum measurement of vacuum device. This book focuses on not only clarifying the physical basis of vacuum technology, but also fully reflecting the new achievements and trends in vacuum technology at home and abroad in the recent two decades. Audience: In the vacuum technology research, production and application of the vast number of science and technology workers, including tertiary institutions related to professional teachers and students and graduate students. The book was published in June 1982. The next volume will be published in April 1985 by the National Defense Industry Press. Under the unified book number