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对分步重复投影半导体光刻机相位光栅对准信号作了详细的分析,提出了更加合理精确的计算模型,并与其他论文中的实验数据作了初步比较,模型与实验更加接近。本文所提供的方法也适用于对有减反膜的
A detailed analysis of phase grating alignment signals for stepper projection of semiconductor lithography is made. A more reasonable and accurate calculation model is proposed, which is compared with experimental data from other papers. The model and experiment are closer to each other. The methods provided in this article also apply to antireflective films