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采用中频孪生非平衡磁控溅射方法制备了纳米晶结构NiOx电致变色薄膜。原子力显微镜(AFM)、掠入射X射线衍射(GID)、X射线反射(XRR)分析薄膜结构、形貌及薄膜厚度;利用电化学设备、紫外分光光度计等手段测试薄膜循环伏安及光谱特性。结果表明:沉积获得NiOx薄膜质地均匀,晶粒尺寸约为4.5 nm,薄膜表面粗糙度Ra=1.659 nm;以Li+离子为致色粒子,厚度60nm的NiOx薄膜在±3 V的高驱动电压下薄膜对可见光透过率调制范围达30%以上,电致变色性能较好。
The nanocrystalline NiOx electrochromic thin films were prepared by IF twin magnetization sputtering. Atomic force microscopy (AFM), grazing incidence X-ray diffraction (GID) and X-ray reflectometry (XRR) were used to analyze the structure and morphology of the films and the film thickness. The cyclic voltammetry and spectral characteristics of the films were measured by electrochemical instruments and UV spectrophotometer . The results show that the NiOx thin film is deposited with a uniform grain size of about 4.5 nm and the surface roughness Ra of the film is 1.659 nm. The thin film of NiOx with thickness of 60 nm and Ni + Modulation range of visible light transmittance of more than 30%, better electrochromic properties.