The electromagnetic (EM) scattering by rivets on the conducting plate is studied for the first time by using electric field integral equation (EFIE) in conjunct
Silicon (111) and Silicon (100) have been employed for fabrication of TiO2 films by metal organic chemical vapor deposition (MOCVD). Titanium (Ⅳ) isopropoxide
The relationships and the features of integration between Enterprise Process Monitoring and Controlling System (EPMCS) and Enterprise Process Related Applicatio