论文部分内容阅读
研究了应用射频磁控溅射法在不同基板上制备ＹＳＺ薄膜和工艺条件对其微观结构的影响。结果表明，在清洁的基板上制备的ＹＳＺ 薄膜经６００ ℃以上热处理后，薄膜表面致密均匀，无裂纹，薄膜与基板的结合紧密。薄膜具有较高的电导率，完全可以作为固体电解质使用。
The effects of RF magnetron sputtering on the microstructure of YSZ thin films prepared by different substrates and the technological conditions were studied. The results show that the YSZ thin film prepared on a clean substrate is heat-treated at above 600 ℃, the surface of the thin film is dense and uniform, and no cracks are formed, and the bonding of the thin film and the substrate is tight. The film has a high conductivity, can be used as a solid electrolyte.