ZnO簿膜是一种优良的压电料材,广泛用于各种频段的声体波、声表面波和声光等器件中.本文概述了ZnO簿膜的应用前景、成膜技术.并简要介绍了磁控溅射的基本原理及特点.文章还介绍了用自行设计改装的R.F.平面磁控溅射装置制作C-轴取向ZnO簿膜的初步情况.采用这种装置得到了比常规R.F.二极溅射淀积速率高5倍的ZnO簿膜,C- 轴取向良好.溅射速率达2—4微米/小时,分散度б≤2°—4°,偏离度m≤1°—2°,P_v≥10~7欧姆-厘米. ZnO film is an excellent piezoelectric material, which is widely used in acoustic wave, surface acoustic wave and acousto-optic devices in various frequency bands. The basic principle and characteristics of magnetron sputtering are introduced.The preliminary situation of making C-axis oriented ZnO film with RF plane magnetron sputtering device designed by ourselves is also introduced.Using this device, Polarization sputtering deposition rate of 5 times higher ZnO film, C-axis orientation good. Sputtering rate of 2-4 microns / hour, dispersion б ≤ 2 ° -4 °, the degree of deviation m ≤ 1 ° -2 ° , P_v ≥ 10 ~ 7 ohm-cm.