利用真空热蒸镀技术,由普通的真空镀膜台制得高透明度高电导率的In_2O_3/In薄膜。其工艺简单,稳定性及重复性好。所得膜的性能可与ITO膜相比拟。对蒸发过程中源处和衬底处可能发生的化学反应所作的热力学分析表明,仅少数反应是有意义的。理论分析与实验结果定性地相符。 Using vacuum thermal evaporation technology, high-transparency and high-conductivity In_2O_3 / In thin films are prepared from ordinary vacuum coating stations. The process is simple, good stability and repeatability. The resulting film performance comparable with the ITO film. The thermodynamic analysis of possible chemical reactions at the source and at the substrate during evaporation shows that only a few reactions make sense. Theoretical analysis and experimental results qualitatively match.