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介绍了纳米标准样板在纳米量值溯源体系中的重要作用和制备纳米标准样板的基本要求,设计了适用于多用途的标准值为100nm纳米台阶标准样板的特征结构和制备工艺流程,阐述了纳米测量装置的工作原理以及原子力测头(AFM)、激光聚焦式测头(LFS)、扫描白光干涉测头(SWLIS)的参数指标和适用范围。分别利用纳米测量机(NMM)的多种测头对纳米标准样板进行表征,对SIMT100纳米标准样板A区域开展重复性实验、区域均匀性实验和长时间稳定性实验。结果表明,设计与制备的SIMT100纳米标准样板A区域的高度值具有较好的量值传递特性。台阶标准片的测量重复性、区域均匀性和稳定性的标准偏差均小于1nm。
The important role of nano-standard template in nano-scale traceability system and the basic requirements for preparation of nano-standard template are introduced. The characteristic structure and preparation process flow of multi-purpose standard plate with standard value of 100nm are designed. The working principle of the measuring device as well as the parameter index and the applicable range of AFM, LFS and SWLIS. Nanometer standard samples were characterized by using a variety of probes of nanometer measuring machine (NMM) respectively. Repeated experiments, area uniformity experiments and long-term stability experiments were performed on SIMT 100 nm standard samples. The results show that the design and preparation of SIMT100 nano-standard sample A value of the region has a good value transfer characteristics. The standard repeatability of step standard patches, the standard deviation of area uniformity and stability are all less than 1 nm.