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氟已成为MCVD法中重要的掺杂剂,其作用是制备各种凹陷内包层的单模光纤。本实验证明:由于CCl_2F_2掺入而使折射率降低△n~-,是与CCl_2F_2流量(或等效分压)的1/5方幕成正比;二氧化硅的沉积效率与一个最佳的CCl_2F_2流量相对应,CCl_2F_2流量过高,形成SiF_4会降低二氧化硅的沉积效率。故合理选择CCl_2F_2的流量,将有助于提高单模光纤预制棒的沉积速率和生产速度,降低光纤成本。
Fluorine has become an important dopant in the MCVD process, the role of which is to prepare a variety of depressed cladding single-mode optical fiber. The experimental results show that the refractive index decreases by Δn ~ - due to the incorporation of CCl_2F_2, which is proportional to the 1/5 scale of CCl_2F_2 flow rate (or equivalent partial pressure). The deposition efficiency of silica is proportional to an optimum CCl_2F_2 Corresponding to the flow, CCl_2F_2 flow is too high, the formation of SiF_4 will reduce the deposition efficiency of silica. Therefore, the reasonable choice of CCl_2F_2 flow rate will help to improve the single-mode optical fiber preform deposition rate and production speed, reduce the cost of optical fiber.