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Aiming at boosting the low ultraviolet (UV)responsivity induced by the negative impact of the surface dead layer in silicon-based conventional photodiode(CPD),
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Aiming at boosting the low ultraviolet (UV)responsivity induced by the negative impact of the surface dead layer in silicon-based conventional photodiode(CPD), Si photodiodes with five different structures, including both the novel grid structure photodiode(GSPD)and CPD, have been manufactured using thermal diffusion process and tested. The results show that the UV responsivity around 365 nm of GSPD could be as high as 6 times that of CPD, while the high visible (VIS) responsivity is sharply suppressed by the employment of grid shaped junction (GSJ) in the GSPD, which has realized the expectation of selective UV enhancement with prospect for application.
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