本文阐述了真空电弧沉积（ＶＡＤ）的各种净化方法，并讨论了纯净化的真空电弧在非晶硅膜层沉积方面的应用，包括在制造太阳能电池方面的应用前景。分析表明，真空电弧沉积非晶硅膜，关键在于合理设计弧源使电弧纯净化，采取各种有效方法抑制宏观颗粒对膜层的污染，同时采用适当的等离子体诊断设备，通过调节等离子体微观参数来控制膜层质量。 This article describes various methods of vacuum arc deposition (VAD) purification, and discusses the application of pure vacuum arc deposition in the deposition of amorphous silicon films, including applications in the manufacture of solar cells. The analysis shows that the vacuum arc deposition of amorphous silicon film, the key lies in the rational design of the arc source to purify the arc to take various effective methods to inhibit macroparticles on the membrane contamination, while using the appropriate plasma diagnostic equipment, by adjusting the plasma microscopic Parameters to control the quality of the film.