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采用电沉积法,在阳极氧化铝(AAO)模板中制备了[NiFe/Cu/Co/Cu]n多层纳米线.利用扫描电子显微镜(SEM)及透射电子显微镜(TEM)对纳米多层线的表面形貌及结构进行了表征,纳米线阵列高度有序、直径均一、层状结构清晰,NiFe层厚度约40 nm,Cu层厚度约60 nm,Co层厚度约15 nm,各子层厚度可控.利用X射线能谱分析仪(EDS)对纳米多层线NiFe层的成分进行了测试,Ni,Fe的原子比为4∶1.利用X射线衍射仪(XRD)对[NiFe/Cu/Co/Cu]n纳米多层膜和多层线结构进行了测试,多层膜为面心立方(fcc)结构,多层线NiFe层为面心立方(fcc)结构,Cu层为六方密排hcp(100),Co层为面心立方(fcc)结构.与组成、结构完全相同的多层膜相比,[NiFe/Cu/Co/Cu]n多层纳米线具有更优越的巨磁电阻性能.
[NiFe / Cu / Co / Cu] n multilayered nanowires were prepared by electrodeposition in anodic aluminum oxide (AAO) template.The morphology of the nanowire multilayered nanowires was characterized by scanning electron microscopy (SEM) and transmission electron microscopy The surface morphology and structure of the nanowire arrays were characterized. The nanowire arrays were highly ordered and uniform in diameter with a clear layered structure. The thickness of NiFe layer was about 40 nm, the thickness of Cu layer was about 60 nm, and the thickness of Co layer was about 15 nm. The composition of the nanometer multilayer NiFe layer was tested by X-ray EDS (EDS), the atomic ratio of Ni and Fe was 4:1. The XRD patterns of [NiFe / Cu / Co / Cu] n multilayered films and multilayered structures were tested. The multilayered films were face centered cubic (fcc) structures, the multilayered NiFe layers were face centered cubic (fcc) structures, and the Cu layers were hexagonal (Hcp (100)), and the Co layer has a face-centered cubic (fcc) structure.Compared with multilayer films with the same composition and structure, [NiFe / Cu / Co / Cu] n multilayer nanowires have more superior giant magnetism Resistance performance.