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在光掩膜工业中,铬合金已经令人满意地被使用了几十年,它可能渐渐被一种更好的合金硅化钼(MoSi)所取代。Photomasks Inc.的CTO Franklin Kalk谈到,他知道有两家半导体公司计划从下一年开始在32 nm逻辑电路的生产中
Chromium alloys have been used satisfactorily for decades in the photomask industry and may gradually be replaced by a better alloy of molybdenum silicide (MoSi). Franklin Kalk, CTO at Photomasks Inc., said he knows two semiconductor companies plan to start production of 32-nm logic circuits from next year