论文部分内容阅读
在原子氧地面模拟设备中对铜片、Al2 O3 涂层试样进行了原子氧暴露实验 ,采用XPS、SEM等分析手段对暴露前后试样表面的物理和化学变化进行了研究。结果表明 :Cu受到原子氧的侵蚀 ,质量有少许增加 ,表面形貌和电学性能有些变化 ;Al2 O3 涂层质量变化很小 ,对基体提供了良好的保护作用。XPS分析结果表明Cu表面形成CuO氧化物层。反应溅射的Al2 O3 涂层是富Al的 ,初始暴露时由于氧化反应而质量有少许增加 ,随时间延长 ,涂层变得完全符合化学计量
Atomic oxygen surface simulation equipment for copper, Al2 O3 coating samples were subjected to atomic oxygen exposure experiments, using XPS, SEM and other analytical means before and after exposure to the sample surface physical and chemical changes were studied. The results show that Cu is attacked by atomic oxygen, the mass is slightly increased, and the surface morphology and electrical properties are somewhat changed. The change of mass of Al 2 O 3 coating is small, which provides a good protection for the substrate. The results of XPS analysis show that the CuO oxide layer is formed on the Cu surface. The reactively sputtered Al 2 O 3 coating is Al-rich, with a slight increase in mass upon initial exposure due to the oxidation reaction. Over time, the coating becomes fully stoichiometric