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采用脉冲激光沉积(PLD)技术,在Si(100)衬底上制备出高度c轴取向的ZnO薄膜。运用X射线衍射(XRD)、光致发光谱(PL)、拉曼光谱(Raman)对衬底温度在300~700℃条件下沉积的氧化锌薄膜进行表征,研究了衬底温度对氧化锌薄膜结构和发光特性的影响。实验表明,700℃条件下沉积的薄膜具有相对较好的结晶质量,其X射线衍射峰半高宽(FWHM)最窄,晶粒最大,近带边紫外发光峰与深能级发光峰的比值显著增强。
High-c-axis oriented ZnO thin films were deposited on Si (100) substrates by pulsed laser deposition (PLD). The ZnO thin films deposited at 300 ~ 700 ℃ were characterized by X-ray diffraction (XRD), photoluminescence (PL) and Raman spectroscopy. The effect of substrate temperature on the deposition of zinc oxide thin films Effect of Structure and Luminescence Properties. The experimental results show that the films deposited at 700 ℃ have relatively good crystalline quality, the FWHM of the X-ray diffraction peak is the narrowest, and the grain size is the largest. The ratio of the near-edge ultraviolet light-emitting peak to the deep-level light emitting peak Significantly enhanced.