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对SF-8型石英微量天平监测过的超薄源和沉积膜,分别采用称重法、电子谱线分析法和背散射法对其厚度进行了比对测量。测量结果一致性较好,并与SF-8型石英微量天平给出的值相符,从而在实验上证明了SF-3型石英微量天平在真空蒸发制备超薄源和沉积膜工作中是厚度监测的可靠工具。
The superfine source and deposited films monitored by SF-8 quartz microbalance were measured by the method of weighting, electron spectroscopy and backscattering respectively. The results are consistent and consistent with the values given by the SF-8 quartz microbalance. It is experimentally demonstrated that the SF-3 quartz microbalance is the monitor of thickness during the vacuum evaporation of ultra-thin source and deposited films Reliable tool.