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利用电荷收集法,在正(135 V)、负(-117 V)偏置和低真空背景(0.5 Pa)三种不同收集条件下,测量了用于等离子体断路开关的电缆等离子体枪产生的低温等离子体的密度和漂移速率,测量值分别为 8.3×1014,1.2×1015,4.8×1014 cm-3;2.5,2.0 cm·μs-1。测量结果表明:三种收集条件下测得的等离子体漂移速率相近;在相同测量点处,负偏置收集条件下测得的等离子体密度大于正偏置和低真空背景收集条件下的测量值,而低真空背景收集条件下的测量值最小。
Using the charge collection method, we measured the plasma generated by a plasma torch used in a plasma cut-off switch under three different collection conditions: positive (135 V), negative (-117 V) bias and low vacuum background The density and drift rate of the low-temperature plasma were 8.3 × 1014, 1.2 × 1015 and 4.8 × 1014 cm-3, respectively, 2.5 and 2.0 cm · μs-1. The measurement results show that the plasma drift rates measured under the three collection conditions are similar; at the same measurement point, the plasma density measured under the negative bias collection conditions is larger than the measurement values under the positive bias and low-vacuum background collection conditions , While the measurement under low vacuum background collection conditions is the smallest.