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反射型魔镜检测方法（Ｒ－ＭＭ）是基于“局域波面畸变”缺陷成像原理的一种光学无损检测方法．我们采用Ｒ－ＭＭ方法检测了大量的硅片和硅外延片，非常方便直观地观测到漩涡缺陷、杂质条纹、管道等十多种反映实际生产工艺问题的缺陷，经化学腐蚀对比实验表明，检测结果是可靠的．在本文中，我们还着重讨论了外延层对衬底结构缺陷“放大”作用及其物理机制．并报道了缺陷种类与外延片类型之间存在的一些特殊对应关系．
Reflective Mirror Inspection Method (R-MM) is an optical non-destructive inspection method based on the principle of “Local Wave Plane Distortion” defect imaging. We use R-MM method to detect a large number of silicon and silicon epitaxial wafers, very convenient and intuitive to observe vortex defects, impurity stripes, pipes and other defects reflect the actual production process more than 10, the chemical corrosion comparison experiments show that the detection The result is reliable. In this paper, we also focus on the “enlargement” effect of the epitaxial layer on the substrate structure defects and its physical mechanism. And reported some special correspondences between the types of defects and the types of epitaxial wafers.