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利用横截面电镜样品,对Ni基体磁控溅射离子镀Al膜进行了透射电镜观察。研究了不同工艺条件下镀膜的组织形态,相结构以及相分布。镀覆5min时,在Ni基体和镀Al膜交界处,发现一个Al-Ni系中迄今未见报道的未知相。经电子衍射分析其为体心四方点阵,a=b=0.588nm,c=0.480nm。研究了随时间变化的镀膜组织结构变化情况。
Using cross-section electron microscopy samples, Ni substrate magnetron sputtered ion-deposited Al film was observed by transmission electron microscopy. The microstructure, phase structure and phase distribution of the coating under different conditions were studied. After plating for 5 min, an unknown phase in Al-Ni system that has not been reported so far was found at the interface between Ni matrix and Al-coated film. Analysis by electron diffraction as a body centered tetragonal lattice, a = b = 0.588 nm, c = 0.480 nm. The change of the microstructure of the coating with time was studied.