热解CVD法生长金刚石薄膜

来源 :人工晶体学报 | 被引量 : 0次 | 上传用户:zuoshuqiong
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本文以有机低分子化合物和氢气为反应气体,用热解 CVD 法生长出金刚石多晶薄膜。用喇曼散射、X 射线衍射、反射高能电子衍射和电子显微镜等方法进行了结构表征。论述了碳源浓度、热丝温度、基片温度和预处理工艺对金刚石薄膜结构和性能的影响。 In this paper, organic low molecular compounds and hydrogen as the reaction gas, the growth of diamond polycrystalline thin films by pyrolysis CVD. The structures were characterized by Raman scattering, X-ray diffraction, high-energy electron beam diffraction and electron microscopy. The effects of carbon source concentration, hot wire temperature, substrate temperature and pretreatment process on the structure and properties of diamond films were discussed.
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