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本文介绍上层蒸发Al~2O_3+SiO_x和底层蒸发Al_2O_3的方法以提高Ag的附着力和保护Ag反射镜的技术。Al_2O_3膜层能增强Ag膜和基片的附着力。实验发现,最佳膜厚对AL_2O_3膜约为300埃,对SiO_x膜在1000～2000埃之间。此时可获得很好的附着并保护Ag表面,而且由于红外吸收所造成的反射率损失为最小。从450毫微米到远红外,即使暴露在苛刻的硫化物和潮湿环境中,用这种方法镀的银面能保持垂直入射的反射率达95％以上。计算表明,采用保护Ag正面与更耐久的金属反射镜(如铝或铑)相比较,在高反射率和低的可见范围的偏振方面,前者更佳。但是,在λ=8.1微米和45°入射情况下,对Ag+Al_2O_3+SiO_x膜层,在较厚的SiO_x膜层内产生明显的二次辐射反射和吸收影响,因此使反射率从98.5％下降到约65％。
This paper introduces the technique of upper layer evaporation Al ~ 2O_3 + SiO_x and bottom evaporation Al_2O_3 to improve the adhesion of Ag and protect the Ag mirror. Al 2 O 3 film can enhance the Ag film and substrate adhesion. The experimental results show that the best film thickness is about 300 Å for AL_2O_3 and about 1000 Å to 2000 Å for SiO_x. In this case, good adhesion and protection of the Ag surface are obtained, and the loss of reflectance due to the infrared absorption is minimized. From 450 nm to far infrared, silver surfaces plated in this way maintain a vertical incidence of reflectivity above 95%, even when exposed to harsh sulfide and humid environments. Calculations show that the former is better in terms of high reflectance and lower polarization in the visible range than the more durable metal mirrors (such as aluminum or rhodium) that protect the front side of Ag. However, with λ = 8.1μm and 45 ° incidence, the Ag + Al_2O_3 + SiO_x film had obvious secondary radiation reflection and absorption effects in the thick SiO_x film, and the reflectance decreased from 98.5% To about 65%.