采用理论计算和光线追迹分析了激光直写光刻中离焦对写入焦斑光场分布的影响;使用四轴激光直写设备开展了离焦激光直写光刻工艺实验,实验和理论计算及光线追迹的结果吻合得很好。利用离焦激光直写光刻方法制作了光栅和分划版,测得实验结果达到工艺要求。 Theoretical calculations and ray tracing were used to analyze the influence of defocusing on the distribution of light field in laser direct writing lithography. Experiments, experiments and theories of defocused laser direct writing lithography were carried out using a four-axis laser writing device The calculated and ray traced results are in good agreement. Using defocused laser direct write lithography method to produce a grating and the division version, measured the experimental results to meet the process requirements.