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本文报道了 TiO_2薄膜的金属有机化合物汽相淀积(简称 MOCVD)技术。用这一技术生长的氧化物薄膜国外已有报道,其中 TiO_2真结晶膜已用于太阳能电池的抗反射镀层,水的光电解和光催化等各个方面,已成为能源研究中的新型材料之一。用 MOCVD 技术生长的薄膜优于通常所采用的 CVD 法和其他的物理沉积方法,易获得优质的结晶薄膜,目前已成为薄膜制备科学中的最新技术。本工艺采用液态(C_4HgO)_4Ti 为生长的物质源,用电阻丝加热,反应室为垂直放置的石英管,用高纯氮(N_2)作载气,液态(C_4HgO)_4Ti 为恒温,并用氮气携
This paper reports the metal organic compound vapor deposition (referred to as MOCVD) technology of TiO 2 thin films. Oxide films grown by this technique have been reported abroad. Among them, the TiO 2 true crystal film has been used in many aspects such as anti-reflective coating of solar cells, photo-electrolysis of water and photocatalysis. It has become one of the new materials in energy research. Thin films grown by MOCVD are superior to the commonly used CVD and other physical deposition methods to obtain high-quality crystalline thin films and are currently the latest technology in thin film science. In the process, liquid (C_4HgO) _4Ti is used as a material source for growth. The reactor is heated by a resistance wire. The reaction chamber is a quartz tube vertically placed. The carrier gas is high purity nitrogen (N 2)