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研究了纯铁在Cl~-与K_2Cr_2Or、C_6H_5COONa、硼酸加硼砂和NaNO_2共存的四种溶液体系中发生孔蚀过程中的电化学噪声。在各溶液中Cl~-浓度不足以引起孔蚀时,检查不到噪声信号。在Cl~-浓度高到足以引起孔蚀时,试样浸入溶液后经过一段诱导期,噪声突然出现。相应一个噪声信号波,有一个腐蚀孔出现,在临界Cl~-浓度下有时虽然也会出现噪声信号,但并未形成可见孔而只是表面变晦暗。所有噪声都是低频1/f噪声。作者认为,这种噪声与半导体器件的“闪烁噪声”相同。
Electrochemical noise in the pitting corrosion process was studied in four solutions of pure iron in the presence of Cl ~ - with K 2 Cr 2 Or, C 6 H 5 COONa, boric acid borax and NaNO 2. In each solution Cl ~ - concentration is not enough to cause pitting, check no noise signal. In Cl ~ - high enough to cause pitting, the sample immersed in solution after a period of induction period, the noise suddenly appeared. Corresponding to a noise signal wave, there is a corrosion hole appears, although the noise signal sometimes appears in the critical Cl ~ - concentration, but did not form a visible hole but only the surface becomes dull. All noise is low frequency 1 / f noise. The authors believe that this noise is the same as the “flicker noise” of semiconductor devices.