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以高纯石墨作靶、氩气(Ar)和三氟甲烷(CHF3)为源气体,用反应磁控溅射法在不同射频功率下制备了氟化类金刚石碳(F-DLC)膜,并对其疏水性进行研究.双蒸水液滴与膜表面接触角的测试结果表明,所制备薄膜表面的最大水接触角可达115°左右.通过原子力显微镜获得的薄膜表面AFM图谱、拉曼光谱以及傅里叶变换红外光谱探讨了影响薄膜的疏水性的因素.结果表明,薄膜的疏水性与薄膜的表面粗糙度和表面键结构直接相关,表面粗糙度越大,疏水性越好,但与薄膜中的F含量和sp3/sp2的比值并未呈单调增加或减小的对应关系.射频输入功率影响着薄膜的沉积速率,与薄膜表面粗糙度、薄膜中芳香环单核的比例以及薄膜表面的键结构(F的接入方式)直接相关.
Fluorinated diamond-like carbon (F-DLC) films were prepared by reactive magnetron sputtering at different RF power with high-purity graphite as target and argon (Ar) and trifluoromethane (CHF3) as source gases The hydrophobicity of the film was studied.The results of the contact angle between the double-distilled water droplets and the film surface show that the maximum water contact angle of the film surface can reach about 115 ° .Analytical AFM, Raman spectrum And Fourier transform infrared spectroscopy (FTIR) were used to investigate the factors that affect the hydrophobicity of the films. The results show that the hydrophobicity of the films is directly related to the surface roughness and surface bond structure of the films. The larger the surface roughness, the better the hydrophobicity. The content of F in the film and the ratio of sp3 / sp2 did not increase or decrease monotonically.The RF input power affected the deposition rate of the film, the film surface roughness, the proportion of aromatic ring mononuclear in the film and the film surface The key structure (F access method) is directly related.