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我们的反应离子腐蚀装置是以刻Al材料为主的一个实验装置。按照腐蚀Al材料的要求我们设计了一个带有预备室的反应室。本文介绍反应室的结构,着重介绍刻Al所必须的预备室及曲面电极结构。
Our reactive ion etching device is an experimental device based on Al material. In accordance with the requirements of the corrosive Al material, we designed a reaction chamber with a preparatory chamber. This article describes the structure of the reaction chamber, highlighting the preparatory chamber and surface electrode structures necessary for etching Al.