采用射频磁控溅射法,以铌靶和硅靶为靶材,在玻璃基片上沉积了NbSiN薄膜。研究了硅靶、铌靶功率、氮气流量以及溅射时间对薄膜光学性能的影响,得出实验室条件下的最佳制备工艺参数。测试结果表明,最佳工艺参数下制备的NbSiN薄膜均匀致密,主要成分为NbN、NbSiN、无定形的Si3N4及少量的SiO2和Nb2N2-xO3+x。光学性能分析表明,NbSiN薄膜在波长550nm处(人眼最敏感)的可见光透射率为90.5%,红外反射率约为28%,光学性能优异。 Using RF magnetron sputtering method, the NbSiN thin film was deposited on the glass substrate with the targets of niobium and silicon as targets. The effects of silicon target, niobium target power, nitrogen flow rate and sputtering time on the optical properties of the films were investigated. The optimum fabrication process parameters were obtained under laboratory conditions. The test results show that the NbSiN thin films prepared under the best processing parameters are uniform and compact, and the main components are NbN, NbSiN, amorphous Si3N4 and a small amount of SiO2 and Nb2N2-xO3 + x. Optical properties analysis shows that the visible light transmittance of NbSiN film at the wavelength of 550nm (human eye is the most sensitive) is 90.5%, the infrared reflectance is about 28%, and the optical properties are excellent.