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为改善金属铀基体的抗腐蚀性能,采用非平衡磁控溅射离子镀技术在不同偏压下于金属铀表面制备CrNx薄膜。采用SEM和AFM研究了薄膜形貌和表面粗糙度,采用X射线光电子能谱研究了薄膜表面的元素分布及化学价态。试验结果表明,采用磁控溅射在较低脉冲偏压下沉积的CrNx薄膜晶粒较细小,偏压越高,表面粗糙度越大。生成的薄膜为Cr+CrN+Cr2N混合结构,并含有少量的Cr2O3,随着偏压的升高,金属态Cr的含量减少,而铬的氮化物的含量增加,所制备薄膜的自然腐蚀电位升高,腐蚀电流密度减小。偏压为-800 V时,所制备的薄膜具有较好的抗腐蚀性能。
In order to improve the corrosion resistance of uranium matrix, CrNx thin films were prepared on the surface of uranium metal by using unbalanced magnetron sputtering ion plating technology. The morphology and surface roughness of the films were investigated by SEM and AFM. The elemental distribution and chemical valence of the films were investigated by X-ray photoelectron spectroscopy. The experimental results show that the CrNx thin films deposited by magnetron sputtering at lower pulse bias are smaller and the higher the bias voltage, the larger the surface roughness. The resulting thin film is Cr + CrN + Cr2N mixed structure and contains a small amount of Cr2O3. With the increase of bias voltage, the content of Cr in the metal state decreases and the content of chromium nitride increases. The natural corrosion potential of the prepared thin film increases High, corrosion current density decreases. The bias voltage of -800 V, the prepared film has good corrosion resistance.