离子镀膜的术语是D.M.Mattox在1964年发表论文时最初使用的,这种技术比用湿式镀膜法所获得的膜有更好的耐热性及耐蚀性.因此这种镀膜的概念给人们留下了极深刻的印象,这种技术就是在气体放电中进行蒸发,它的基础在于真空技术.以前的真空蒸发是以求出真空室内的真空度,基片表面的清净度,基片温度,基片表面的晶体结构与蒸发膜的结晶性的关系的外延问题作为主要研究对象,而在离子镀膜 The term ion plating was first used by DMMattox when it was published in 1964. This technique offers better heat resistance and corrosion resistance than those obtained with wet coating methods. Under the very deep impression, this technique is to evaporate in the gas discharge, which is based on the vacuum technology.Vacuum evaporation in the past is to find out the vacuum in the vacuum chamber, the substrate surface cleanliness, substrate temperature, The epitaxial problem of the relationship between the crystal structure of the substrate surface and the crystallinity of the evaporated film is taken as the main research object,