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为研究不同晶粒尺寸纳米钛膜的储氦行为,在He-Ar混合气体下,用磁控溅射方法沉积纳米晶钛膜,利用PBS(proton backscattering)、XRD(X-ray diffraction)对膜的氦含量和微观结构及晶粒大小进行了研究。结果表明:在其它实验参数不变的情况下,当沉积温度从60℃升至350℃时得到均匀分布的含氦量(指原子百分比)从38.6%逐渐降至9.2%的钛膜,其平均晶粒由13.1nm增加到44.2nm;当He/Ar分压比分别为6、10、15、19时得到均匀分布的含氦量分别为17.6%、47.2%、48.3%和38.6%的钛膜。He的引入引起(002)晶面衍射峰向小角度移动,但(100)晶面衍射峰不变,即晶胞参数c增加,a不变化;随膜中He含量的增加,衍射峰展宽,晶粒变小,显示出氦的掺入有抑制纳米晶粒长大的趋势。
In order to study the storage and helium behavior of nano-sized titanium films with different grain sizes, a nanocrystalline titanium film was deposited by magnetron sputtering under He-Ar mixed gas. The films were characterized by proton backscattering (PBS) and X-ray diffraction The helium content, microstructure and grain size were studied. The results show that when the deposition temperature is increased from 60 ℃ to 350 ℃, the uniform distribution of the content of helium (atomic percentage) is gradually decreased from 38.6% to 9.2% under the condition of other experimental parameters, the average And the grain size increases from 13.1nm to 44.2nm. When the He / Ar partial pressure ratios are 6, 10, 15, and 19, the uniformly distributed titanium films with 17.6%, 47.2%, 48.3% and 38.6% . The diffraction peak of (002) crystal face shifts to a small angle when He is introduced, but the diffraction peak of (100) crystal face does not change, that is, the unit cell parameter c increases and a does not change. With the increase of He content in the film, The grains become smaller, showing that the incorporation of helium tends to inhibit the growth of nanocrystalline grains.