利用对向靶溅射，同时对基片进行退火处理的方法，在玻璃基片上成功地制备出了NdFe7-xMox（x=0，0．5）薄膜，并对其进行了磁性研究。VSM测量结果表明，Mo掺入导致了材料矫顽力Hc的增大，却相应降低了饱和磁化强度Ms。随着退火温度T的提高，Hc随之增大，当T=573K时，出现一极大值为37．8kA／m，此时的热磁测量表明，样品具有最高居里温度，Tc=775K。 NdFe7-xMox (x = 0,0.5) thin films were successfully prepared on glass substrate by using the target sputtering and the annealing of the substrate. The magnetic properties of NdFe7-xMox films were investigated. The measurement results of VSM show that the incorporation of Mo leads to the increase of the coercivity Hc, but decreases the saturation magnetization accordingly. With the increase of annealing temperature T, Hc increases. When T = 573K, a maximum value of 37.8kA / m appears. The thermomagnetic measurement at this time shows that the sample has the highest Curie temperature, Tc = 775K .