论文部分内容阅读
用Ａｕｇｅｒ电子能谱研究铂薄膜中氧和碳杂质的行为．结果表明，氧和碳受它们在铂膜中扩散过程限制．在１０００℃上、下两个温区，氧具有不同的扩散激活能，分别等于０．９８和０．４４ｅＶ；５５０─１０００℃温度范围内，氧向膜外扩散，使铂膜净化；１０００─１２００℃温度范围内，氧向膜内扩散，使铂膜氧化．在所研究的整个温度范围内，碳的扩散激活能等于０．５２ｅｖ，其扩散行为和氧相同，且随着氧含量的增减而增减．
Auger electron spectroscopy was used to study the behavior of oxygen and carbon impurities in platinum films. The results show that oxygen and carbon are limited by their diffusion in the platinum film. At 1000 ℃, the next two temperature zones, oxygen has a different diffusion activation energy, respectively, equal to 0.98 and 0.44eV; 550 ─ 1000 ℃ temperature range, the oxygen diffusion to the membrane, the platinum membrane purification; 1200 ℃ temperature range, the oxygen diffusion to the film, the platinum film oxidation. The diffusion activation energy of carbon is equal to 0.52ev over the entire temperature range studied, its diffusion behavior is the same as that of oxygen, and it increases or decreases as the oxygen content increases or decreases.