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通过化学气沉积过程中掺B,制备的金刚石膜电阻率下降10-19,导致金刚石膜整体导电,可采用电火花抛光。用扫描电镜和Raman分析了金刚石膜电加工表面的形貌和成分。金刚石膜的电火花抛光是多种效应综合作用的结果,即金刚石膜熔化、汽化、碳的氧化和蒸发、爆炸抛出、界面的化学反应以及金刚石的石墨化。通过实验研究了电加工参数对表面粗糙度和加工速度的影响,通过回归分析得到电火花抛光表面粗糙度和加工速度的经验公式,其相关系数的平方分别为0.91和0.99,表明拟合精度高。试验结果表明,放电电流和脉冲宽度对加工面的表面粗糙度和加工速度影响很大。放电电流为5 A、脉冲宽度为380μs时,抛光后表面粗糙度Ra<1μm。
Through the chemical vapor deposition process B doped, the prepared diamond film resistivity decreased 10-19, resulting in the overall conductive diamond film, spark polishing can be used. The morphology and composition of the surface of diamond films were analyzed by SEM and Raman. The EDM of diamond films is the result of a combination of effects such as diamond film melting, vaporization, carbon oxidation and evaporation, explosive ejection, chemical reactions at the interface, and graphitization of diamond. The influence of electrical processing parameters on the surface roughness and processing speed was studied experimentally, and the empirical formula of EDM surface roughness and processing speed was obtained by regression analysis. The squared correlation coefficients were 0.91 and 0.99 respectively, which showed that the fitting accuracy was high . The experimental results show that discharge current and pulse width have a great influence on the surface roughness and processing speed of the machined surface. Discharge current of 5 A, the pulse width of 380μs, polished surface roughness Ra <1μm.