为了解决大面积类金刚石薄膜的均匀性,首先要研究脉冲离子源所镀制的类金刚石薄膜的厚度分布曲线。针对这一目的,做了大量工艺实验,在不同的脉冲离子源电源参数(主回路电压,脉冲频率)、基片高度以及磁场等工艺参数下制备了样品,并选择了一种合适的膜厚测量仪器进行了膜厚分布测量,获得了在各种工艺参数下脉冲离子源所镀膜层厚度的分布曲线。 In order to solve the uniformity of large area diamond-like carbon films, the thickness distribution of diamond-like carbon films coated with pulsed ion source should be studied first. For this purpose, a large number of experiments have been done to prepare samples with different parameters of the pulse source (main circuit voltage, pulse frequency), substrate height and magnetic field, and a suitable film thickness The measuring instrument measured the film thickness distribution and obtained the distribution curve of the coating thickness of the pulsed ion source under various process parameters.