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近年来,准分子激光器(excimer laser)以其高能量的脉冲式紫外(193nm或248nm)激光输出特征而被人们用于部分薄膜材料的加工和制备,其原理是用聚焦后的准分子激光脉冲对靶材进行轰击,一定条件下将轰击出来的靶材颗粒均匀沉积在基片上便可以生长出薄膜结构,这种方法又称为PLD(Pulse laser deposition)技术.利用准分子激光器和石英位相光栅模板,人们已经在光敏光纤和光敏光波导中写入了性能良好的Bragg折射率光栅,由于LiNbO_3(LN)和 LITaO_3(LT)这两种重要的光学晶体均对准分子激光波长(248 nm)产生强烈吸收,所以当它们被该激光照射时,激光能量将被晶体吸收并产生热量.如果激光的能量密
In recent years, excimer lasers have been used for the processing and preparation of partial thin film materials by their high-energy pulsed ultraviolet (193 nm or 248 nm) laser output characteristics. The principle of the excimer laser is to use the focused excimer laser pulse The target material bombardment, under certain conditions will bombard the target particles uniformly deposited on the substrate can grow a thin film structure, this method is also known as PLD (Pulse laser deposition) technology.Using excimer lasers and quartz phase grating Template, a good Bragg refractive index grating has been written in photosensitive and photosensitive optical waveguides. Since two important optical crystals, LiNbO_3 (LN) and LITaO_3 (LT), are aligned with the molecular laser wavelength (248 nm) Strong absorption, so when they are irradiated by the laser, the laser energy will be absorbed by the crystal and generate heat.If the laser energy is close