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采用射频反应磁控溅射法在中国低活化马氏体(CLAM)不锈钢表面制备了单层A12O3、SiC、W薄膜以及SiC/A12O3、W/A12O3双层膜。对所制备的薄膜进行了XRD结构分析、AFM表面形貌测试和显微硬度测试。结果表明:单层SiC薄膜表面出现了部分脱落,而SiC/A12O3双层膜表面完整光滑。W/A12O3双层薄膜表面平整光滑,均方根粗糙度为4.28 nm。W单层薄膜和W/A12O3双层薄膜经氩气中800℃退火2 h后硬度最高,分别达到了34.4 GPa和31.3 GPa。
A single layer of A12O3, SiC, W thin films and SiC / A12O3, W / A12O3 bilayer films were prepared by radio frequency reactive magnetron sputtering on the surface of low activated martensitic (CLAM) stainless steel. The prepared films were analyzed by XRD, AFM surface morphology and microhardness test. The results show that the surface of single-layer SiC film partially falls off, while the surface of SiC / A12O3 double-layer film is completely smooth. The surface of W / A12O3 bilayer film is smooth and the root mean square roughness is 4.28 nm. W monolayer films and W / A12O3 double-layer films annealed at 800 ℃ in argon for 2 h had the highest hardness of 34.4 GPa and 31.3 GPa, respectively.