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应用X射线衍射分析研究了活化源功率对反应溅射离子镀TiN涂层相组成的影响。随着活化功率的增加,膜层相组成朝着富氮相及其含量增加的方向发展,变化趋势为:(αTi+Ti_2N+TiN)→(Ti_2N+TiN)→TiN。活化源功率对膜层硬度的影响,主要是膜层相组成变化引起的,而由Ti_2N和TiN两相组成的膜硬度最高。
X-ray diffraction analysis was used to study the influence of active power on the phase composition of TiN coating by reactive sputter ion plating. With the increase of the activation power, the phase composition of the film grows towards the nitrogen-rich phase and its content increases. The changing trend is: (αTi + Ti_2N + TiN) → (Ti_2N + TiN) → TiN. The influence of activation source power on the hardness of the coating is mainly caused by the change of phase composition of the coating, while the hardness of the film composed of Ti_2N and TiN phases is the highest.