本文介绍了采用国产的片状固态磷扩散源所进行的磷扩散工艺实验及其结果。有效成分为偏磷酸铝和焦磷酸硅的磷源片具有无毒、贮运方便等优点,固态源扩散的系统简单,操作容易。实验的结果表明,扩散结深、扩散薄层电阻、结的击穿电压等参数均能满足常规硅平面工艺的要求,扩散的均匀性也是令人满足的。 This paper introduces the experiment and results of phosphorus diffusion process using domestic flake solid state phosphorus diffusion source. The active ingredient is the phosphorus source of aluminum metaphosphate and silicon pyrophosphate, which has the advantages of non-toxicity, convenient storage and transportation, etc. The system of the solid source diffusion is simple and the operation is easy. The experimental results show that the diffusion junction depth, the diffusion sheet resistance, the junction breakdown voltage and other parameters can meet the requirements of the conventional silicon planar process, the diffusion uniformity is also satisfactory.