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为确定合适的TiO2薄膜退火工艺,研究了退火温度对采用中频交流反应磁控溅射技术制备的TiO2薄膜光学性能的影响。利用分光光度计测得石英玻璃基体TiO2薄膜试样的透射谱和反射谱,用包络线法和经验公式法计算出薄膜的光学常数。结果表明:TiO2薄膜的折射率随退火温度的上升而增加,低温退火时薄膜消光系数略有减小,500℃退火时TiO2薄膜具有最优的光学性能。
In order to determine the suitable TiO2 film annealing process, the influence of annealing temperature on the optical properties of TiO2 thin films prepared by MF AC magnetron sputtering was studied. The transmission spectrum and reflection spectrum of TiO2 thin film were measured by spectrophotometer. The optical constants were calculated by envelope method and empirical formula method. The results show that the refractive index of TiO2 film increases with the increase of annealing temperature, and the extinction coefficient of the film decreases slightly at low temperature annealing. The TiO2 film has the best optical properties when annealed at 500 ℃.