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研究了PbO光电导摄象管中PbO膜层的烧伤行为,发现了烧伤随靶压降低和光通量增大而加重,并且常与光电流随靶压变化不呈现饱和状态同时产生。分析蒸发淀积膜层工艺和制管工艺过程中烧伤的产生和变化,以及膜层结构的特征,认为微晶多孔PbO膜层吸气能力极强,微量水气、CO_2沾污膜层是产生烧伤的主要原因。采用HCl低温处理膜层,可以降低PbO膜层比表面积,从而显著降低吸气能力,对改善烧伤有明显效果。对试验结果也进行了初步讨论。
The burn behavior of PbO film in PbO photoconductive photodiode was studied. It was found that the burns increased with the decrease of target pressure and the increase of luminous flux, and the photocurrent was always generated at the same time with the change of target voltage. Analysis of the evaporation deposition film and the process of tube manufacturing process and the occurrence and change of the burn, as well as the characteristics of the film structure, that porous microcrystalline porous PbO strong suction capacity, trace moisture, CO_2 stained film is generated The main reason for the burn. Low temperature treatment with HCl film, can reduce the specific surface area of PbO film, thereby significantly reducing the inspiratory capacity, have a significant effect on improving burn. The experimental results also conducted a preliminary discussion.