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在基于莫尔条纹相位匹配的纳米压印对准方案中,因阻蚀胶引入引起压印对准标记光栅副间隙介质的改变,使得莫尔条纹图像的对比度下降,恶化了压印对准精度.针对这一问题,本文提出了利用优化的标记材料来制备凸起光栅标记从而提高莫尔条纹图像对比度的方法.该方法为提高莫尔条纹图像对比度,通过FDTD(有限时域差分)软件,对玻璃模板及硅片基底上采用的光栅标记材料及光栅副间隙进行了优化计算,在采用常规压印阻蚀胶(折射率为1.6)、压印模板与基底间间隙为200nm、且光栅标记为凸起时,优化光栅标记材料为:玻璃模板上光栅标记为折射率2.0的ITO;基底下光栅标记为折射率2.7的Cr.实验结果表明:在光栅副的间隙介质分别为折射率1.6的阻蚀胶和折射率1.3的水时,采用优化材料的凸起光栅标记(周期为6和6.1μm的光栅副)得到的莫尔条纹图像的对比度与原标记相比分别提高了11.92%和4.66%.
In the nano-imprint alignment scheme based on Moiré fringe phase matching, the change of the sub-gap medium caused by the imprinting of the alignment mark grating due to the introduction of the anti-corrosive glue causes the contrast of the moiré fringe image to be reduced and deteriorates the imprinting alignment accuracy In order to improve the contrast of Moiré fringes, this paper presents a method to improve the contrast of Moiré fringe by using raised marker to fabricate raised grating marks.Through FDTD (finite difference time-domain) software, The grating marking material and the grating sub-gap used on the glass template and the silicon wafer substrate are optimized and calculated. When conventional stamping resist (refractive index 1.6) is used, the gap between the imprint template and the substrate is 200 nm, and the grating mark For the convex, the optimized grating mark material is: ITO with a grating index of 2.0 on the glass template and Cr under a substrate index of 2.7.The experimental results show that the gap media in the grating pair have a refractive index of 1.6 Resist contrast, and water with a refractive index of 1.3, the contrast of the moiré fringes obtained with raised grating marks of the optimized material (grating pairs of periods 6 and 6.1 μm) compared to the original mark Do not improved 11.92% and 4.66%.