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利用脉冲多弧离子镀技术在硅基底上沉积类金刚石薄膜。分析了类金刚石薄膜的性能（硬度和电阻率）和工艺参数的关系；讨论了薄膜的耐磨性能。结果表明：类金刚石薄膜的硬度及电阻率都和基底温度、主回路电压及脉冲频率有关，两者随工艺参数变化规律相同，薄膜有良好的耐磨性。
Diamond - like carbon films were deposited on silicon substrates by pulsed multi - arc ion plating. The relationship between the properties (hardness and resistivity) of diamond-like carbon films and the process parameters was analyzed. The wear resistance of the films was also discussed. The results show that the hardness and resistivity of diamond-like carbon films are related to the substrate temperature, main circuit voltage and pulse frequency. Both of them have the same variation with process parameters, and the films have good wear resistance.