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控制住铝膜上小丘的产生是成功地制作VLSI器件重要的一环。本文报出的出的这些方法对于减低这些小丘的产生是有效的。
Controlling the generation of hillocks on the aluminum film is an important part of the successful fabrication of VLSI devices. These methods presented here are effective in reducing the production of these hillocks.