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感应耦合等离子体刻蚀后的光栅出现衍射效率不均匀的现象,文章从光刻胶均匀性、掩模均匀性、刻蚀工艺等方面对该不均匀现象进行了分析。分析结果表明,刻蚀工艺是造成光栅衍射效率不均匀的主要原因。文中采用增加旋转工装的方式来解决了衍射效率不均匀的问题。该方法的应用对其他产品的刻蚀与其他设备的使用提供了帮助。
The phenomenon of uneven diffraction efficiency appears in the grating after the inductively coupled plasma etching. The article analyzes the uneven phenomenon from the aspects of photoresist uniformity, mask uniformity and etching process. The analysis results show that the etching process is the main reason for the uneven grating diffraction efficiency. In this paper, the method of increasing the rotating tooling is adopted to solve the problem of non-uniform diffraction efficiency. The application of this method helped to etch other products and the use of other equipment.