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等离子体基注渗技术在材料表面改性中具有极为重要的应用,本文报道了一种实现恒温条件的N等离子体基注渗的工艺方法,利用该方法可以根据工艺研究需要,实现注渗剂量、注渗能量(加速电压)和注渗温度单一参数调节,为等离子体体基注渗工艺的优化提供了一种切实可行的研究方法。利用本文提出的工艺方法,对纯铁进行了各种温度下的N离子注渗。结果表明,处理过程中,可依据工艺设计,单参数大范围改变注渗电压或注渗恒温温度,温度波动很小,离子注入层厚度得到明显提高。
Plasma-based infiltration technique plays an extremely important role in the surface modification of materials. In this paper, a method for infusing N-plasma based on constant temperature conditions is reported. According to the need of process research, , The energy of injection (acceleration voltage) and the single parameter of injection temperature provide a feasible method for the optimization of plasma-based infiltration process. Using the process proposed in this article, pure iron was infiltrated with N ions at various temperatures. The results show that during the process of treatment, the infiltration voltage or the infiltration constant temperature can be widely changed according to the process design and single parameter. The temperature fluctuation is very small and the thickness of the ion implantation layer is obviously increased.