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结合实验中的工艺技术参数,以Pb,Ti两金属靶的反应共溅射为例,对我们提出的金属氧化物薄膜的多离子束反应共溅射模型进行数值计算,分别得出了各靶的溅射速率R,反应腔中反应气体分压p以及衬底Pb,Ti的金属单质和氧化物所占的有效面积百分比与反应共溅射中直接可调的物理量,即反应气体总量Q和溅射离子束流J的关系.计算结果表明,该模型揭示了反应溅射具有滞回效应的本质特征,反映了反应共溅射中相关参数的相互影响与相互耦合的特点,给出了薄膜中组分原子百分比及其氧化物的形态与溅射工艺的关系,指出了多离子束反应共溅射中稳恒溅射的调控途径和方法.该模型的数值计算结果均与已有的实验结果相符合.
Combined with the experimental technical parameters, taking reactive co-sputtering of Pb and Ti metal targets as an example, the multi-ion beam co-sputtering model of metal oxide films proposed by us was numerically calculated, Sputtering rate R, reaction gas partial pressure p in the reaction chamber, and the effective area percentage of the metal elements and oxides of the substrates Pb and Ti and the physical quantity directly adjustable in the reactive co-sputtering, that is, the total amount Q of reactive gases And sputtering ion beam J. The calculated results show that the model reveals the essential characteristics of reactive sputtering with hysteresis effect and reflects the mutual influence and mutual coupling of the related parameters in reactive co-sputtering, The relationship between atomic percentage of oxide and its morphology and the sputtering process is pointed out, and the regulation and control methods and methods for the steady sputtering in the multi-ion beam reactive sputtering are pointed out. The numerical results of the model are consistent with those of the existing The experimental results are consistent.