论文部分内容阅读
精确的光学常数对于设计和制备高品质的光学薄膜非常重要,尤其是那些光学性能对折射率变化敏感的薄膜。SiO_2是一种常用的低折射率材料,因与常用基底折射率相近使其准确拟合有一定难度。实验通过离子束溅射制备了SiO_2单层膜。考虑测量时的误差和基底折射率的影响,采用透射率包络和反射率包络得到了SiO_2的折射率,并用所得折射率进行反演来对这两种途径在实际测量拟合过程中的准确性进行比对。分析表明,剩余反射率在实际的测量过程中误差更小,直接用测量镀膜前后基片的剩余反射率值可以更简便更准确地得到SiO_2的折射率,能达到10~(-2)的精度。
Precise optical constants are important for the design and fabrication of high quality optical films, especially those whose optical properties are sensitive to changes in refractive index. SiO 2 is a commonly used low refractive index material, which has some difficulties due to the similar refractive index with the common substrate. Experiments ion-beam sputtering prepared SiO 2 monolayer. Taking into account the measurement error and substrate refractive index, the refractive index of SiO 2 was obtained by using the envelope of transmittance and the envelope of reflectivity, and the refractive index of the SiO 2 was used to invert the two approaches in the actual measurement fitting process Accuracy comparison. The analysis shows that the residual reflectance is less error in the actual measurement process. The direct measurement of the residual reflectance before and after the coating can obtain the refractive index of SiO_2 more easily and accurately, and can achieve the accuracy of 10 -2 .